IC Mask Design is launching a new training course in Q2 2022. The “Design for Layout” course is targeted at designers who wish to learn tips and tricks to improve layout efficiency while at the same time maximising circuit functionality.
Ultimately silicon functionality is the responsibility of the Circuit Designer, but the decisions that Circuit Designers make during the design process not only impact circuit functionality but they can also greatly influence the layout process. In terms of layout, the decisions designers make, often innocuous decisions, can significantly impact layout quality. They can introduce risk to silicon in terms of introducing latch-up risk or potentially yield risk through issues such as pattern density. More importantly in a world where Layout resources are incredibly scarce and schedules are incredibly tight, design decisions can often impact greatly the layout efficiency.
IC Mask Design’s “Design for Layout” course has taken 20+ years of working with over 250 different Design teams and distilled this experience into a short course that examines how Layout and Design can be married together so that Circuit Designers can design their circuits with layout in mind while still not impacting circuit performance. The course looks at real tips and tricks that will improve layout efficiency and reduce costly layout tuning cycles. The Design for Layout course is a must for design teams under pressure with layout teams to produce quality layouts in the shortest possible time.
This is an on-line course and we are taking pre-launch bookings now. If you are interested please contact James Telfer email: JTelfer@icmaskdesign.com or telephone: +353 86 380 4708.
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