– Submicron Nodes (>180nm)
At nodes like 0.25u and above manufacturing processes are robust enough to ensure that circuit layout doesn’t have the same impact on circuit performance or manufacturing yield as it would have on smaller geometries.
However layout quality should not be ignored, and layout cycle times are still important considerations when working on these technologies. With strong knowledge, deep understanding and experience in working on these technologies across multiple foundries including TSMC, UMC, ST, IBM, Maxim, AMS, Atmel, Jaz, Dongbu. Vanguard Telefunken, Grace and Infineon, IC Mask Designs layout methodology addresses many of the challenges associated with limited metal stacks, interconnect delays due to parasitics, and antenna effects.